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Dr. Brent Gila


Dr. Brent Gila received his PhD in 2000 in Materials Science & Engineering at the University of Florida. His background is primarily synthesis and characterization of materials with over 16 years experience with molecular beam epitaxy (MBE) of wide band gap semiconductors and oxide dielectric materials and with metal-organic chemical vapor deposition (MOCVD) of nitride materials, and a wide experience with electron beam microscopy and spectroscopy. Recently he has begun to explored alternative means of graphene fabrication that include ion implantation into single crystal and polycrystalline substrates.

Dr. Gila is currently a research scientist at the University of Florida and has worked in the fields of gate dielectrics and passivation for wide bandgap semiconductors, nitride semiconductor devices, solid state sensors, graphene fabrication and advanced materials processing. In 2008 he, joined the Nanoscale Research Facility as a staff scientist and has aided with the facility planning and operations and assisted with the development of non-gallium focused ion beam (FIB) lithography. In 2011, he became the Director of the Nanoscale Research Facility.

Brent is a member of the American Vacuum Society, Materials Research Society and the Electrochemical Society. He has authored or co-authored over 100 articles and two book chapters in his field of research.


The University of Florida and the College of Engineering is highly dedicated to education and research in the field of nano science and technology. Characterization and fabrication support facilities have been created to promote and enhance research activities by the UF faculty, students and staff. Several Centers and Institutes are also being developed to unite researchers of different fields so they may support common collaborative goals in developing nano technology.